Sputtering and other types of physical vapor deposition are a mainstay of our business. We consistently produce our own sputtering targets and deposit films on numerous substrate materials. A large portion of our work in the sputter deposition realm supports programs for DoD prime contractors and other DoD entities. Our sputter deposition processing capabilities include:
- DC and Bipolar Pulsed DC Magnetron Sputtering
- Low (45kHz) and Medium Frequency (400kHz) AC Magnetron Sputtering
- RF (2.0 & 13.56 MHz) Magnetron Sputtering
- Ion Assisted Deposition; DC and AC Substrate Biasing
- Sample Heating with Various Types of Motion (linear, rotary, etc.)
- Etch and Sputter Coating of Parts up to 36” Diameter